X-ray diffraction phenomenon is explained as a process in which X-rays are scattered by electrons of atoms.

A diffracted beam is produced only when it is scattered under certain geometric conditions that satisfy Bragg's law or Laue's equation.

Through the analysis of this diffraction phenomenon, it is possible to find out information such as the size, structure, and direction of the unit structure of a substance.

This equipment is mainly used for precise analysis of crystal structure of thin film samples, structural analysis characteristics of epitaxial layers, and density, roughness and thickness analysis of single/multi-layer thin films through reflection measurement.

1. X-Ray Generator: 9KW X-Ray Generator / Radiation Enclosure W/Warning Lamp

2. X-Ray Rotating Anode: Cu Fine Focus Rotating Anode

3. Goniometer Sys.: SmaftLab Theta-Theta Goniometer W/Horizontal Sample Mounting / Goniometer Radius: 300mm

4. Detector: Scintillation Counter with Control Driver & HV/PHA Unit

5. Stage   : Std. Base/XY-20mm/RxRy/Powder Diffraction Sample Stages

6. Sample Plate(4" Wafer)

7. Incident Optics
 - CBO(CrossBeamOptics): (X-ray Wavelength)Cu-K Alpha
 - Slit Optics Sys.  / -Auto Variable Divergence Slit(DS)
 - Parallel Slit Sys./ -Ge(220) 2-Bounce/4-Bounce Monochrometer

8. Receiving Optics
 - Auto Attenuator   / -Auto Variable Scattering/Receiving Slit(SS/RS)
 - Receiving Soller Slit Optic System   / -Diffracted Beam Monochromator W/Curved&Flat Crystal(Cu)

9. In-Plan Arm Sys.

10. Domed Heating Stage,DHS900

11. S/W: Thin Film/Powder Diffraction Application